Tingjun WU, associate professor and master's supervisor, graduated from Dalian University of Technology in 2011 with a Bachelor's degree in Chemical Engineering, and graduated from University of California, Riverside in 2016 with a Ph.D. degree. He joined Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences in 2021. His main research focuses on electroplating and other semiconductor wet processes as well as related materials, and he is engaged in the synthesis and application of functional semiconductor materials. He has published more than 10 papers.

Selected Publications：

1. Yu He, Tingjun Wu, Lei Zhu, Xin Li, Weimin Li, Wenjie Yu, “Effect of imine-containing inhibitor molecules on cobalt electrodeposition”, Semiconductor Technology, 2023, 48(10): 911-918.

2. Tingjun Wu, Jiwon Kim, Nosang V. Myung, “Electrochemical Mechanism of Tellurium Reduction in Alkaline Medium”, Frontiers in Chemistry, 2020, 8(00084).

3. Tingjun Wu et al., “Application of Perovskite‐Structured Materials in Field‐Effect Transistors”, Advanced Electronic Materials, 2019, 1900444.

4. Tingjun Wu et al., “Electrodeposition of Compact Tellurium Thick Films from Alkaline Baths”, Journal of The Electrochemical Society, 2017,164(2), D82–D87.

5. Tingjun Wu et al., “Electrodeposition of dense lead telluride thick films in alkaline solutions”, Journal of The Electrochemical Society, 2016,163(14), D801.